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dc.contributor.authorHoffmann, Jahn-
dc.contributor.authorSchulz, Kai Marvin-
dc.contributor.authorPitruzzello, Giampaolo-
dc.contributor.authorFohrmann, Lena Simone-
dc.contributor.authorPetrov, Alexander Yu-
dc.contributor.authorEich, Manfred-
dc.date.accessioned2019-02-07T08:21:03Z-
dc.date.available2019-02-07T08:21:03Z-
dc.date.issued2018-12-10-
dc.identifier.citationScientific Reports 1 (8): - (2018-12-01)de_DE
dc.identifier.issn2045-2322de_DE
dc.identifier.urihttps://tubdok.tub.tuhh.de/handle/11420/1991-
dc.description.abstractGrating couplers are a fundamental building block of integrated optics as they allow light to be coupled from free-space to on-chip components and vice versa. A challenging task in designing any grating coupler is represented by the need for reducing back reflections at the waveguide-grating interface, which introduce additional losses and undesirable interference fringes. Here, we present a design approach for focusing TM grating couplers that minimizes these unwanted reflections by introducing a modified slot that fulfills an anti-reflection condition. We show that this antireflection condition can be met only for the Bloch mode of the grating that concentrates in the dielectric. As a consequence the light is scattered from the grating coupler with a negative angle, referred to as “backscattering design”. Our analytic model shows that the anti-reflection condition is transferrable to grating couplers on different waveguide platforms and that it applies for both TE and TM polarizations. Our experimentally realized focusing grating coupler for TM-modes on the silicon photonics platform has a coupling loss of (3.95 ± 0.15) dB at a wavelength of 1.55 µm. It has feature sizes above 200 nm and fully etched slots. The reflectivity between the grating coupler and the connected waveguide is suppressed to below 0.16%.en
dc.language.isoende_DE
dc.publisherMacmillan Publishers Limited, part of Springer Naturede_DE
dc.relation.ispartofScientific reportsde_DE
dc.rightsinfo:eu-repo/semantics/openAccessde_DE
dc.subject.ddc600: Technikde_DE
dc.titleBackscattering design for a focusing grating coupler with fully etched slots for transverse magnetic modesde_DE
dc.typeArticlede_DE
dc.identifier.urnurn:nbn:de:gbv:830-882.025961-
dc.identifier.doi10.15480/882.1988-
dc.type.diniarticle-
dc.subject.ddccode600-
dcterms.DCMITypeText-
tuhh.identifier.urnurn:nbn:de:gbv:830-882.025961-
tuhh.oai.showtruede_DE
dc.identifier.hdl11420/1991-
tuhh.abstract.englishGrating couplers are a fundamental building block of integrated optics as they allow light to be coupled from free-space to on-chip components and vice versa. A challenging task in designing any grating coupler is represented by the need for reducing back reflections at the waveguide-grating interface, which introduce additional losses and undesirable interference fringes. Here, we present a design approach for focusing TM grating couplers that minimizes these unwanted reflections by introducing a modified slot that fulfills an anti-reflection condition. We show that this antireflection condition can be met only for the Bloch mode of the grating that concentrates in the dielectric. As a consequence the light is scattered from the grating coupler with a negative angle, referred to as “backscattering design”. Our analytic model shows that the anti-reflection condition is transferrable to grating couplers on different waveguide platforms and that it applies for both TE and TM polarizations. Our experimentally realized focusing grating coupler for TM-modes on the silicon photonics platform has a coupling loss of (3.95 ± 0.15) dB at a wavelength of 1.55 µm. It has feature sizes above 200 nm and fully etched slots. The reflectivity between the grating coupler and the connected waveguide is suppressed to below 0.16%.de_DE
tuhh.publisher.doi10.1038/s41598-018-36082-z-
tuhh.publication.instituteOptische und Elektronische Materialien E-12de_DE
tuhh.identifier.doi10.15480/882.1988-
tuhh.type.opus(wissenschaftlicher) Artikelde
tuhh.institute.germanOptische und Elektronische Materialien E-12de
tuhh.institute.englishOptische und Elektronische Materialien E-12de_DE
tuhh.gvk.hasppnfalse-
openaire.rightsinfo:eu-repo/semantics/openAccessde_DE
dc.type.driverarticle-
dc.rights.ccbyde_DE
dc.rights.ccversion4.0de_DE
dc.type.casraiJournal Articleen
tuhh.container.issue1de_DE
tuhh.container.volume8de_DE
tuhh.container.startpageArt.-Nr. 17746de_DE
dc.relation.projectOpen Access Publizieren 2018 - 2019 / TU Hamburgde_DE
dc.rights.nationallicensefalsede_DE
item.fulltextWith Fulltext-
item.creatorGNDHoffmann, Jahn-
item.creatorGNDSchulz, Kai Marvin-
item.creatorGNDPitruzzello, Giampaolo-
item.creatorGNDFohrmann, Lena Simone-
item.creatorGNDPetrov, Alexander Yu-
item.creatorGNDEich, Manfred-
item.creatorOrcidHoffmann, Jahn-
item.creatorOrcidSchulz, Kai Marvin-
item.creatorOrcidPitruzzello, Giampaolo-
item.creatorOrcidFohrmann, Lena Simone-
item.creatorOrcidPetrov, Alexander Yu-
item.creatorOrcidEich, Manfred-
item.grantfulltextopen-
crisitem.author.deptOptische und Elektronische Materialien E-12-
crisitem.author.deptOptische und Elektronische Materialien E-12-
crisitem.author.deptOptische und Elektronische Materialien E-12-
crisitem.author.orcid0000-0002-9213-9645-
crisitem.author.orcid0000-0002-3096-5693-
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