Lipka, TimoTimoLipkaMoldenhauer, LennartLennartMoldenhauerMüller, JörgJörgMüllerTrieu, Hoc KhiemHoc KhiemTrieu2021-05-272021-05-272015-07-24Optics Express 23 (15): 20075-20088 (2015-07-27)http://hdl.handle.net/11420/9620Large-scale integrated silicon photonic circuits suffer from two inevitable issues that boost the overall power consumption. First, fabrication imperfections even on sub-nm scale result in spectral device non-uniformity that require fine-tuning during device operation. Second, the photonic devices need to be actively corrected to compensate thermal drifts. As a result significant amount of power is wasted if no athermal and wavelength-trimmable solutions are utilized. Consequently, in order to minimize the total power requirement of photonic circuits in a passive way, trimming methods are required to correct the device inhomogeneities from manufacturing and athermal solutions are essential to oppose temperature fluctuations of the passive/active components during run-time. We present an approach to fabricate CMOS backend-compatible and athermal passive photonic filters that can be corrected for fabrication inhomogeneities by UV-trimming based on low-loss amorphous-SOI waveguides with TiO cladding. The trimming of highly confined 10 μm ring resonators is proven over a free spectral range retaining athermal operation. The athermal functionality of 2nd-order 5 μm add/drop microrings is demonstrated over 40.C covering a broad wavelength interval of 60 nm. 2en1094-40872015152007520088Soc.TechnikJournal Article10.1364/OE.23.020075Other