Walter, RamonRamonWalterTittl, AndreasAndreasTittlBerrier, AudreyAudreyBerrierSterl, FlorianFlorianSterlWeiss, ThomasThomasWeissGiessen, HaraldHaraldGiessen2026-03-252026-03-252015-01-02Advanced Optical Materials 3 (3): 398-403 (2015)https://hdl.handle.net/11420/62398Optical elements with absorbance close to unity are of crucial importance for diverse applications, ranging from thermal imaging to sensitive trace gas detection. A key factor for the performance of such devices is the need for absorbance with high acceptance angles, which are able to utilize all incident radiation from the forward-facing half-space. Here, a tunable, angle-, and polarization independent large-area perfect absorber is reported, which is fabricated by a combination of colloidal lithography and dry-etching. This design is easy and fast to produce, and low-cost compared with other common methods. Variation of the dry-etching time shifts the resonance from almost 825 to 1025 nm with reflection smaller than 3% and zero transmission. Due to the inherent disordered arrangement, this design is fully polarization independent and the absorbance remains higher than 98% for incident angles up to 50°.en2195-107120153398403Wiley-VCHColloidal etching lithographyLarge-area fabricationLow costPerfect plasmonic absorberTunabilityTechnology::600: TechnologyJournal Article10.1002/adom.201400545Journal Article