Huster, JensJensHusterMüller, JostJostMüllerRenner, HagenHagenRennerBrinkmeyer, ErnstErnstBrinkmeyer2022-08-252022-08-252011-07-14Journal of Lightwave Technology 29 (17): 5953460 2621-2628 (2011)http://hdl.handle.net/11420/13502We present an approach for periodical structuring of large-area photoresist gratings with short periods based on a deep-ultraviolet (DUV) lithography process. Our procedure of inscribing gratings on planar surfaces using a scanning phase-mask interferometer and including a technique for suppressing the disturbing influence of the zeroth-order diffraction is demonstrated and compared to well-established methods. Applying this approach, large-area, centimeter-scale chirped photoresist gratings with a central period of 225 nm, a chirp rate of 0.5 nm/cm and a duty cycle of 50% have been fabricated on planar silicon chips. © 2011 IEEE.en0733-872420111726212628OpticaBragg gratingsinterferometric lithographynanochannel arraynanopatterningoptical diffractionsilicon on insulator technology (SOI)PhysikJournal Article10.1109/JLT.2011.2161863Other