Wafer-Scale Fabrication of Hierarchically Porous Silicon and Silica by Active Nanoparticle-Assisted Chemical Etching and Pseudomorphic Thermal Oxidation

Gries, Stella Inge MarthaStella Inge MarthaGriesBrinker, ManuelManuelBrinkerZeller-Plumhoff, BeritBeritZeller-PlumhoffRings, DagmarDagmarRingsKrekeler, TobiasTobiasKrekelerGreving, ImkeImkeGrevingHuber, PatrickPatrickHuber2022-10-252022-10-252022-10-25http://hdl.handle.net/11420/13708Dataset containing analysis on a hierarchical porous silicon structure. The structure consists of 1µm macropores hexagonally arranged and interconnected by mesopores in the range of 60nm. Included are a scanning electron micrograph of an overview of the macroporous structure which can be analysed to obtain structural properties such as the pore diameter, surface roughness, surface area and pore volume. Also included are reconstructed transmission electron microscopy and transmission x-ray microscopy tomography data to analyse the same structural parameters on smaller and larger length scale, respectively.enhttps://creativecommons.org/publicdomain/zero/1.0/porous siliconsilicahierarchical porositymetal-assisted chemical etchingsilver nanoparticlesChemieIngenieurwissenschaftenWafer-Scale Fabrication of Hierarchically Porous Silicon and Silica by Active Nanoparticle-Assisted Chemical Etching and Pseudomorphic Thermal OxidationDataset10.15480/336.462010.15480/336.4620Deutsches Elektronen-Synchrotron (DESY)Helmholtz-Zentrum HereonResearchData