Böscke, Tim S.Tim S.BösckeKudelka, StephanStephanKudelkaSänger, AnnetteAnnetteSängerMüller, JörgJörgMüllerKrautschneider, WolfgangWolfgangKrautschneider2024-07-162024-07-162006Proceedings of the 36th European Solid-State Device Research Conference, 2006, ESSDERC 2006, 19 - 21 Sept. 2006, Montreux, Switzerland. - Seite 391-3941-4244-0301-4978-1-4244-0301-1https://hdl.handle.net/11420/48374This paper deals with the investigation of mechanisms leading to a degradation of the electrical properties of titanium nitride - aluminum oxide - titanium nitride capacitors at high temperatures. Several degradation mechanisms could be identified by thorough electrical and physical characterization. The findings will serve as a future guide to build thermally stable MIM capacitors.enTechnology::621: Applied Physics::621.3: Electrical Engineering, Electronic EngineeringInvestigation of the high temperature stability of TiN-Al2O3-TiN capacitors for sub 50nm deep trench DRAMConference Paper10.1109/essder.2006.307720Conference Paper