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Large-area low-cost tunable plasmonic perfect absorber in the near infrared by colloidal etching lithography
Publikationstyp
Journal Article
Date Issued
2015-01-02
Sprache
English
Author(s)
Journal
Volume
3
Issue
3
Start Page
398
End Page
403
Citation
Advanced Optical Materials 3 (3): 398-403 (2015)
Publisher DOI
Scopus ID
Publisher
Wiley-VCH
Optical elements with absorbance close to unity are of crucial importance for diverse applications, ranging from thermal imaging to sensitive trace gas detection. A key factor for the performance of such devices is the need for absorbance with high acceptance angles, which are able to utilize all incident radiation from the forward-facing half-space. Here, a tunable, angle-, and polarization independent large-area perfect absorber is reported, which is fabricated by a combination of colloidal lithography and dry-etching. This design is easy and fast to produce, and low-cost compared with other common methods. Variation of the dry-etching time shifts the resonance from almost 825 to 1025 nm with reflection smaller than 3% and zero transmission. Due to the inherent disordered arrangement, this design is fully polarization independent and the absorbance remains higher than 98% for incident angles up to 50°.
Subjects
Colloidal etching lithography
Large-area fabrication
Low cost
Perfect plasmonic absorber
Tunability
DDC Class
600: Technology