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  4. Applying a physics-based via model for the simulation of Through Silicon Vias
 
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Applying a physics-based via model for the simulation of Through Silicon Vias

Publikationstyp
Conference Paper
Date Issued
2013
Sprache
English
Author(s)
Dahl, David  
Duan, Xiaomin  
Beyreuther, Anne  
Ndip, Ivan N.  
Lang, Klaus-Dieter  
Schuster, Christian  
Institut
Theoretische Elektrotechnik E-18  
TORE-URI
http://hdl.handle.net/11420/7517
Start Page
65
End Page
68
Article Number
6703468
Citation
2013 IEEE 22nd Conference on Electrical Performance of Electronic Packaging and Systems (EPEPS) : 27 - 30 Oct. 2013, DoubleTree by Hilton Hotel, San Jose, California, USA / sponsored by the IEEE Microwave Theory and Techniques Society and the IEEE Components, Packaging and Manufacturing Technology Society. - Piscataway, NJ : IEEE, 2013. - Art.-Nr. 6703468, i.e. Seite 65-68
Contribution to Conference
IEEE 22nd Conference on Electrical Performance of Electronic Packaging and Systems, EPEPS 2013  
Publisher DOI
10.1109/EPEPS.2013.6703468
Scopus ID
2-s2.0-84893631746
Publisher
IEEE
This paper presents a first approach for the efficient modeling of Through Silicon Vias based on a Physics-Based Via model for application in silicon interposers with metallic boundaries. © 2013 IEEE.
Subjects
3D interconnects
Physics-Based Via Model
Through Silicon Vias
DDC Class
530: Physik
600: Technik
620: Ingenieurwissenschaften
More Funding Information
Deutsche Forschungsgemeinschaft (DFG)
TUHH
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