Scanning phase-mask DUV inscription of short-period large-area photoresist gratings

Journal
Journal of lightwave technology  
Volume
29
Issue
17
Start Page
2621
End Page
2628
Article Number
5953460
Citation
Journal of Lightwave Technology 29 (17): 5953460 2621-2628 (2011)
Publisher DOI
10.1109/JLT.2011.2161863
Scopus ID
2-s2.0-80052046829
Publisher
Optica
We present an approach for periodical structuring of large-area photoresist gratings with short periods based on a deep-ultraviolet (DUV) lithography process. Our procedure of inscribing gratings on planar surfaces using a scanning phase-mask interferometer and including a technique for suppressing the disturbing influence of the zeroth-order diffraction is demonstrated and compared to well-established methods. Applying this approach, large-area, centimeter-scale chirped photoresist gratings with a central period of 225 nm, a chirp rate of 0.5 nm/cm and a duty cycle of 50% have been fabricated on planar silicon chips. © 2011 IEEE.
Subjects
Bragg gratings
interferometric lithography
nanochannel array
nanopatterning
optical diffraction
silicon on insulator technology (SOI)
DDC Class
530: Physik