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  4. Functional vanadium oxide nanostructures fabricated via atomic layer deposition: a review
 
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Functional vanadium oxide nanostructures fabricated via atomic layer deposition: a review

Citation Link: https://doi.org/10.15480/882.17091
Publikationstyp
Review Article
Date Issued
2026-05-05
Sprache
English
Author(s)
Hedrich, Carina  
Betriebseinheit Elektronenmikroskopie BEEM  
Blick, Robert H.  
Ritter, Martin  orcid-logo
Betriebseinheit Elektronenmikroskopie BEEM  
Zierold, Robert  
Pagnan Furlan, Kaline  orcid-logo
TORE-DOI
10.15480/882.17091
TORE-URI
https://hdl.handle.net/11420/63032
Journal
Applied materials today  
Volume
50
Article Number
103248
Citation
Applied Materials Today 50: 103248 (2026)
Publisher DOI
10.1016/j.apmt.2026.103248
Scopus ID
2-s2.0-105037808296
Publisher
Elsevier
Vanadium oxide nanostructures have emerged as a promising material system for a wide range of applications based on their structural, electronic, optical, and catalytic properties. The multiple phases of vanadium oxides, e.g., V2O3, VO2, and V2O5, feature distinct crystal structures and properties which contribute to their versatility. There are several methods to fabricate vanadium oxide nanostructures such as sol-gel synthesis, hydrothermal methods, physical vapor deposition, sputter deposition, chemical vapor deposition, atomic layer deposition (ALD), and solid-state reactions. From those techniques, ALD offers precise control over the conformality, thickness, and composition of thin films leading to unique possibilities for the functionalization of previously prepared nanostructured templates with vanadium oxides. This review summarizes recent advancements in the synthesis of ALD-based vanadium oxide nanostructures focusing on suitable ALD precursors, ALD process conditions, and required post-deposition thermal annealing treatments to transform the as-deposited vanadium oxide films to distinguished crystalline phases. The functional properties of ALD-based vanadium oxide nanostructures in catalysis, electrochemical energy storage, sensors, and stimuli-responsive “smart” devices are presented. Moreover, existing challenges in fabrication and practical application are discussed. Finally, future perspectives on tailoring the properties of ALD-based vanadium oxide nanostructures by adjusting templates, optimizing the vanadium oxide film thickness, or utilizing supercycle ALD processes are outlined, which can pave the way for sustainable applications and “smart” devices.
Subjects
Atomic layer deposition
Functional oxides
Nanostructures
Phase control
Thermal annealing
Vanadium oxide
DDC Class
620.5: Nanotechnology
540: Chemistry
621.3: Electrical Engineering, Electronic Engineering
Funding(s)
EXC 3120 - BlueMat - Wassergesteuerte Materialien  
SFB 1615 - SMARTe Reaktoren für die Verfahrenstechnik der Zukunft  
Lizenz
https://creativecommons.org/licenses/by/4.0/
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