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  4. Gate insulators and interface effects in organic thin-film transistors
 
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Gate insulators and interface effects in organic thin-film transistors

Publikationstyp
Journal Article
Date Issued
2008-02
Sprache
English
Author(s)
Yildirim, Faruk Altan  
Optische und Elektronische Materialien E-12  
Schliewe, Robert Roman  
Bauhofer, Wolfgang  
Optische und Elektronische Materialien E-12  
Meixner, Ronald M.  
Göbel, Holger  
Krautschneider, Wolfgang  
Nano- und Medizinelektronik E-9 (H)  
TORE-URI
https://hdl.handle.net/11420/47988
Journal
Organic electronics  
Volume
9
Issue
1
Start Page
70
End Page
76
Citation
Organic Electronics 9 (1): 70-76 (2008-02)
Publisher DOI
10.1016/j.orgel.2007.09.005
Scopus ID
2-s2.0-36849019996
Publisher
Elsevier Science
This paper presents a detailed characterization of different thermosetting polymers to be used as gate dielectrics in organic thin-film transistors. Selected materials yield smooth films with good insulation properties and offer attractive processing conditions. Bottom-gate transistors were prepared using these dielectrics and compared to hybrid transistors with surface-treated SiO2 as the dielectric. Gate bias induced leakage and solvent effects were investigated by preparing metal/insulator/semiconductor devices. Poly(3-hexylthiophene) (P3HT) transistors with organic dielectrics exhibited higher channel conductivity and lower mobility values with respect to P3HT-hybrid transistors and pentacene transistors. The importance of dielectric/semiconductor interface was discussed by comparing the performances of pentacene and P3HT transistors produced on different dielectrics.
Subjects
Interface
Organic thin-film transistor
P3HT
Polymer dielectric
Solvents
DDC Class
621.3: Electrical Engineering, Electronic Engineering
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