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Spatially resolved loss measurement in silicon waveguides using optical frequency-domain reflectometry
Publikationstyp
Journal Article
Publikationsdatum
2011-05-26
Sprache
English
Enthalten in
Volume
47
Issue
11
Start Page
668
End Page
670
Citation
Electronics Letters
Publisher DOI
Scopus ID
Publisher
IET
Spatially resolved determination of loss in silicon nanophotonic waveguides using optical frequency-domain reflectometry is reported. Taking measurements from either side of a waveguide, discriminating loss from non-uniform scattering properties is demonstrated. This technique is fast, nondestructive and does not require any knowledge about the launching efficiency. © 2011 The Institution of Engineering and Technology.
DDC Class
620: Engineering