Spatially resolved loss measurement in silicon waveguides using optical frequency-domain reflectometry

Spatially resolved determination of loss in silicon nanophotonic waveguides using optical frequency-domain reflectometry is reported. Taking measurements from either side of a waveguide, discriminating loss from non-uniform scattering properties is demonstrated. This technique is fast, nondestructive and does not require any knowledge about the launching efficiency. © 2011 The Institution of Engineering and Technology.

DDC Class

620: Engineering

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Spatially resolved loss measurement in silicon waveguides using optical frequency-domain reflectometry