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  4. Magnetron sputter deposition of nanostructured AlN thin films
 
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Magnetron sputter deposition of nanostructured AlN thin films

Citation Link: https://doi.org/10.15480/882.8977
Publikationstyp
Journal Article
Date Issued
2023-10-05
Sprache
English
Author(s)
Chirumamilla, Manohar 
Krekeler, Tobias  
Betriebseinheit Elektronenmikroskopie M-26  
Wang, Deyong  
Kristensen, Peter K.  
Ritter, Martin  orcid-logo
Betriebseinheit Elektronenmikroskopie M-26  
Popok, Vladimir N.
Pedersen, Kjeld  
TORE-DOI
10.15480/882.8977
TORE-URI
https://hdl.handle.net/11420/44796
Journal
Applied nano  
Volume
4
Issue
4
Start Page
280
End Page
292
Citation
Applied Nano 4 (4): 280-292 (2023)
Publisher DOI
10.3390/applnano4040016
Publisher
Multidisciplinary Digital Publishing Institute
Peer Reviewed
true
Aluminum nitride (AlN) is a material of growing interest for power electronics, fabrication of sensors, micro-electromechanical systems, and piezoelectric generators. For the latter, the formation of nanowire arrays or nanostructured films is one of the emerging research directions. In the current work, nanostructured AlN films manufactured with normal and glancing angle magnetron sputter depositions have been investigated with scanning and transmission electron microscopy, X-ray diffraction, atomic force microscopy, and optical spectroscopy. Growth of the nanostructures was realized utilizing metal seed particles (Ag, Au, and Al), allowing the control of the nucleation and following growth of AlN. It was demonstrated how variations of seed particle material and size can be used to tune the parameters of nanostructures and morphology of the AlN films. Using normal angle deposition allowed the growth of bud-shaped structures, which consisted of pillars/lamellae with wurtzite-like crystalline structures. Deposition at a glancing angle of 85° led to a film of individual nanostructures located near each other and tilted at an angle of 33 degree; relative to the surface normal. Such films maintained a high degree of wurtzite-like crystallinity but had a more open structure and higher roughness than the nanostructured films grown at normal incidence deposition. The developed production strategies and recipes for controlling parameters of nanostructured films pave the way for the formation of matrices to be used in piezoelectric applications.
Subjects
aluminum nitride
glancing angle deposition
magnetron sputter deposition
nanostructures
piezoelectric materials
DDC Class
620: Engineering
Funding(s)
Nanoscale Energy Generators (NNF20OC0064735)
Funding Organisations
Novo Nordisk Foundation
Publication version
publishedVersion
Lizenz
https://creativecommons.org/licenses/by/4.0/
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