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Modeling random telegraph signals in the gate current of metal-oxide-semiconductor field effect transistors after oxide breakdown
Publikationstyp
Journal Article
Date Issued
2003-07-01
Sprache
English
Author(s)
Arbeitsbereich Mikroelektronik (H 4-08)
Journal
Volume
94
Issue
1
Start Page
703
End Page
708
Citation
Journal of Applied Physics 94 (1): 703-708 (2003)
Publisher DOI
Scopus ID
Publisher
American Institute of Physics
The study presents the measurement data of random telegraph signals (RTS) in the gate current of n-channel metal-oxide-semiconductor field effect transistors (MOSFETs) after oxide breakdown. Two types of behavior were observed of the time constants and the relative amplitudes of the signals as a function of gate voltage. A theory is developed relating time constants and relative amplitudes of the fluctuations to the energetic and geometric trap location in the oxide.
DDC Class
621.3: Electrical Engineering, Electronic Engineering