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  4. On the optimum resolution of transmission-electron backscattered diffraction (t-EBSD)
 
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On the optimum resolution of transmission-electron backscattered diffraction (t-EBSD)

Publikationstyp
Journal Article
Date Issued
2016-01
Sprache
English
Author(s)
Bremen, Rik van  
Ribas Gomes, Diego  orcid-logo
Jeer, Leo T. H. de  
Ocelík, Václav  
De Hosson, Jeff  
TORE-URI
http://hdl.handle.net/11420/14123
Journal
Ultramicroscopy  
Volume
160
Start Page
256
End Page
264
Citation
Ultramicroscopy 160 (): 256-264 (2016-01-01)
Publisher DOI
10.1016/j.ultramic.2015.10.025
Scopus ID
2-s2.0-84946780710
Publisher
Elsevier Science
The work presented aims at determining the optimum physical resolution of the transmission-electron backscattered diffraction (t-EBSD) technique. The resolution depends critically on intrinsic factors such as the density, atomic number and thickness of the specimen but also on the extrinsic experimental set-up of the electron beam voltage, specimen tilt and detector position. In the present study, the so-called physical resolution of a typical t-EBSD set-up was determined with the use of Monte Carlo simulations and confronted to experimental findings. In the case of a thin Au film of 20. nm, the best resolution obtained was 9. nm whereas for a 100. nm. Au film the best resolution was 66. nm. The precise dependence of resolution on thickness was found to vary differently depending on the specific elements involved. This means that the resolution of each specimen should be determined individually. Experimentally the median probe size of the t-EBSD for a 140. nm thick AuAg specimen was measured to be 87. nm. The first and third quartiles of the probe size measurements were found to be 60. nm and 118. nm. Simulation of this specimen resulted in a resolution of 94. nm which fits between these quartiles.
Subjects
Monte Carlo simulation
Resolution
Transmission electron back scatter diffraction
DDC Class
530: Physik
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