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Amorphous silicon for the application in integrated optics
Citation Link: https://doi.org/10.15480/882.781
Other Titles
Amorphes Silizium zur Anwendung in der integrierten Optik
Publikationstyp
Doctoral Thesis
Date Issued
2010
Sprache
English
Author(s)
Advisor
Title Granting Institution
Technische Universität Hamburg
Place of Title Granting Institution
Hamburg
Examination Date
2010-02-15
Institut
TORE-DOI
New fields of application for amorphous silicon in integrated optics are developed. First, the influence of deposition method and process parameters on the material properties is investigated. The effects of thermal treatments are analyzed. Low-loss, monomode waveguides are fabricated. Then, a low-temperature PECVD process is used to realize a three-dimensional taper concept with shadow masks. The feasibility to stack waveguides application of a planarization process is studied, and vertical coupling between waveguides is simulated in order to estimate process specifications. Furthermore, waveguides with horizontal slots are fabricated.
Subjects
amorphes Silizium, Integrierte Optik, optische Wellenleiter
amorphous silicon, integrated optics, waveguides
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