Please use this identifier to cite or link to this item: https://doi.org/10.15480/882.1638
This item is licensed with a CreativeCommons licence by/3.0
Publisher DOI: 10.1088/1361-648X/aaac91
Title: Suppression of material transfer at contacting surfaces: the effect of adsorbates on Al/TiN and Cu/diamond interfaces from first-principles calculations
Language: English
Authors: Feldbauer, Gregor 
Wolloch, Michael 
Bedolla, Pedro O. 
Redinger, Josef 
Vernes, András 
Mohn, Peter 
Keywords: DFT;heterointerfaces;nanotribology;material transfer;adhesion;passivation;electronic structure
Issue Date: 16-Feb-2018
Publisher: IOP
Source: Journal of Physics: Condensed Matter 10 (30): 105001- (2018)
Journal or Series Name: Journal of Physics: Condensed Matter 
Abstract (english): The effect of monolayers of oxygen (O) and hydrogen (H) on the possibility of material transfer at aluminium/titanium nitride (Al/TiN) and copper/diamond (Cu/Cdia) interfaces, respectively, were investigated within the framework of density functional theory (DFT). To this end the approach, contact, and subsequent separation of two atomically flat surfaces consisting of the aforementioned pairs of materials were simulated. These calculations were performed for the clean as well as oxygenated and hydrogenated Al and Cdia surfaces, respectively. Various contact configurations were considered by studying several lateral arrangements of the involved surfaces at the interface. Material transfer is typically possible at interfaces between the investigated clean surfaces; however, the addition of O to the Al and H to the Cdia surfaces was found to hinder material transfer. This passivation occurs because of a significant reduction of the adhesion energy at the examined interfaces, which can be explained by the distinct bonding situations.
URI: http://tubdok.tub.tuhh.de/handle/11420/1641
DOI: 10.15480/882.1638
ISSN: 1361-648X
Institute: Keramische Hochleistungswerkstoffe M-9 
Type: (wissenschaftlicher) Artikel
Appears in Collections:Publications (tub.dok)

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