Publisher DOI: | 10.1002/admi.201700912 | Title: | Low-Temperature Mullite Formation in Ternary Oxide Coatings Deposited by ALD for High-Temperature Applications | Language: | English | Authors: | Furlan, Kaline P. ![]() Krekeler, Tobias Ritter, Martin ![]() Blick, Robert Schneider, Gerold A. Nielsch, Kornelius Zierold, Robert Janßen, Rolf |
Issue Date: | 8-Dec-2017 | Source: | Advanced Materials Interfaces 23 (4): 1700912 (2017-12-08) | Abstract (english): | Atomic layer deposition (ALD) process presents thickness control in an Ångstrom scale due to its inherent surface self-limited reactions. In this work, an ALD super cycle approach, where a superposition of nanolaminates of SiO2 and Al2O3 is generated by cycling the precursors APTES–H2O–O3 and TMA–H2O, is used to deposit thin films with varying ratio of Al2O3:SiO2 into silicon wafers and into inverse photonic crystals. The resulting ternary oxide films deposited at low temperature (150 °C) are amorphous. However, conversion to mullite occurs at 1000 °C, way below the conversion temperatures found into powder processing or diphasic sol–gel routes (type II) and comparable to monophasic sol–gel synthesis. By means of such a mullite coating, the structural stability of an Al2O3 inverse photonic crystal is increased up to 1400 °C. |
URI: | http://hdl.handle.net/11420/3007 | ISSN: | 2196-7350 | Journal: | Advanced materials interfaces | Institute: | Keramische Hochleistungswerkstoffe M-9 | Document Type: | Article | Project: | SFB 986: Teilprojekt C5 - Oxidische Hochtemperatur-Schutzschichtsysteme mittels angepasster Porenstruktur SFB 986: Zentralprojekt Z3 - Elektronenmikroskopie an multiskaligen Materialsystemen |
Appears in Collections: | Publications without fulltext |
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