Please use this identifier to cite or link to this item: https://doi.org/10.15480/882.2721
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dc.contributor.authorChirumamilla, Manohar-
dc.contributor.authorKrishnamurthy, Gnanavel Vaidhyanathan-
dc.contributor.authorRout, Surya Snata-
dc.contributor.authorRitter, Martin-
dc.contributor.authorStörmer, Michael-
dc.contributor.authorPetrov, Alexander-
dc.contributor.authorEich, Manfred-
dc.date.accessioned2020-03-19T12:36:32Z-
dc.date.available2020-03-19T12:36:32Z-
dc.date.issued2020-02-27-
dc.identifier.citationScientific Reports 1 (10): 3605 (2020)de_DE
dc.identifier.issn2045-2322de_DE
dc.identifier.urihttp://hdl.handle.net/11420/5427-
dc.description.abstractCommercial deployment of thermophotovoltaics (TPV) is lacking behind the implementation of solar PV technology due to limited thermal stability of the selective emitter structures. Most of the TPV emitters demonstrated so far are designed to operate under high vacuum conditions (~10−6 mbar vacuum pressure), whereas under medium vacuum conditions (~10−2 mbar vacuum pressure), which are feasible in technical implementations of TPV, these emitters suffer from oxidation due to significant O2 partial pressure. In this work, the thermal stability of 1D refractory W-HfO2 based multilayered metamaterial emitter structure is investigated under different vacuum conditions. The impact of the O2 partial pressure on thermal stability of the emitters is experimentally quantified. We show that, under medium vacuum conditions, i.e. ~10−2 mbar vacuum pressure, the emitter shows unprecedented thermal stability up to 1300 °C when the residual O2 in the annealing chamber is minimized by encapsulating the annealing chamber with Ar atmosphere. This study presents a significant step in the experimental implementation of high temperature stable emitters under medium vacuum conditions, and their potential in construction of economically viable TPV systems. The high TPV efficiency, ~50% spectral efficiency for GaSb PV cell at 1300 °C, and high temperature stability make this platform well suited for technical application in next-generation TPV systems.en
dc.description.sponsorshipFinancial support from the Deutsche Forschungsgemeinschaft (DFG, German Research Foundation) – Projektnummer 192346071 – SFB 986de_DE
dc.language.isoende_DE
dc.publisherMacmillan Publishers Limited, part of Springer Naturede_DE
dc.relation.ispartofScientific reportsde_DE
dc.subject.ddc600: Technikde_DE
dc.titleThermal stability of tungsten based metamaterial emitter under medium vacuum and inert gas conditionsde_DE
dc.typeArticlede_DE
dc.identifier.doi10.15480/882.2721-
dc.type.diniarticle-
dcterms.DCMITypeText-
tuhh.identifier.urnurn:nbn:de:gbv:830-882.080105-
tuhh.oai.showtruede_DE
tuhh.abstract.englishCommercial deployment of thermophotovoltaics (TPV) is lacking behind the implementation of solar PV technology due to limited thermal stability of the selective emitter structures. Most of the TPV emitters demonstrated so far are designed to operate under high vacuum conditions (~10−6 mbar vacuum pressure), whereas under medium vacuum conditions (~10−2 mbar vacuum pressure), which are feasible in technical implementations of TPV, these emitters suffer from oxidation due to significant O2 partial pressure. In this work, the thermal stability of 1D refractory W-HfO2 based multilayered metamaterial emitter structure is investigated under different vacuum conditions. The impact of the O2 partial pressure on thermal stability of the emitters is experimentally quantified. We show that, under medium vacuum conditions, i.e. ~10−2 mbar vacuum pressure, the emitter shows unprecedented thermal stability up to 1300 °C when the residual O2 in the annealing chamber is minimized by encapsulating the annealing chamber with Ar atmosphere. This study presents a significant step in the experimental implementation of high temperature stable emitters under medium vacuum conditions, and their potential in construction of economically viable TPV systems. The high TPV efficiency, ~50% spectral efficiency for GaSb PV cell at 1300 °C, and high temperature stability make this platform well suited for technical application in next-generation TPV systems.de_DE
tuhh.publisher.doi10.1038/s41598-020-60419-2-
tuhh.publication.instituteOptische und Elektronische Materialien E-12de_DE
tuhh.publication.instituteBetriebseinheit Elektronenmikroskopie M-26de_DE
tuhh.identifier.doi10.15480/882.2721-
tuhh.type.opus(wissenschaftlicher) Artikel-
dc.type.driverarticle-
dc.rights.cchttps://creativecommons.org/licenses/by/4.0/de_DE
dc.type.casraiJournal Article-
tuhh.container.issue1de_DE
tuhh.container.volume10de_DE
dc.rights.nationallicensefalsede_DE
tuhh.container.articlenumber3605de_DE
local.status.inpressfalsede_DE
item.fulltextWith Fulltext-
item.languageiso639-1en-
item.creatorGNDChirumamilla, Manohar-
item.creatorGNDKrishnamurthy, Gnanavel Vaidhyanathan-
item.creatorGNDRout, Surya Snata-
item.creatorGNDRitter, Martin-
item.creatorGNDStörmer, Michael-
item.creatorGNDPetrov, Alexander-
item.creatorGNDEich, Manfred-
item.cerifentitytypePublications-
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.creatorOrcidChirumamilla, Manohar-
item.creatorOrcidKrishnamurthy, Gnanavel Vaidhyanathan-
item.creatorOrcidRout, Surya Snata-
item.creatorOrcidRitter, Martin-
item.creatorOrcidStörmer, Michael-
item.creatorOrcidPetrov, Alexander-
item.creatorOrcidEich, Manfred-
item.openairetypeArticle-
item.grantfulltextopen-
crisitem.author.deptOptische und Elektronische Materialien E-12-
crisitem.author.deptBetriebseinheit Elektronenmikroskopie M-26-
crisitem.author.deptBetriebseinheit Elektronenmikroskopie M-26-
crisitem.author.deptOptische und Elektronische Materialien E-12-
crisitem.author.deptOptische und Elektronische Materialien E-12-
crisitem.author.orcid0000-0002-6812-286X-
crisitem.author.orcid0000-0003-0359-7693-
crisitem.author.orcid0000-0002-5664-859X-
crisitem.author.orcid0000-0002-9031-9642-
crisitem.author.orcid0000-0002-9213-9645-
crisitem.author.orcid0000-0002-3096-5693-
crisitem.author.parentorgStudiendekanat Elektrotechnik, Informatik und Mathematik-
crisitem.author.parentorgStudiendekanat Maschinenbau-
crisitem.author.parentorgStudiendekanat Maschinenbau-
crisitem.author.parentorgStudiendekanat Elektrotechnik, Informatik und Mathematik-
crisitem.author.parentorgStudiendekanat Elektrotechnik, Informatik und Mathematik-
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