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Novel photoinjector laser providing advanced pulse shaping for FLASH and EuXFEL
Citation Link: https://doi.org/10.15480/882.18332
Publikationstyp
Conference Paper
Date Issued
2025-11-05
Sprache
English
Author(s)
Ahmend, A.
Akcaalan, O.
Beutner, B.
Brinker, F.
Jiang, Y.
Guetg, M.
Kschuev, N.
Schaper, L.
Schulz, S.
Tomin, S.
Vidoli, C.
Walker, S.
Winkelmann, L.
TORE-DOI
Start Page
2564
End Page
2567
Citation
16th International Particle Accelerator Conference, IPAC 2025
Contribution to Conference
Publisher DOI
Publisher
JACoW Publishing
ISBN of container
978-3-95450-248-6
We recently commissioned the Next GenerAtion Photocathode Laser system (NEPAL) in Hamburg’s XFEL facilities (FLASH and EuXFEL) and at DESY’s Photoinjector Test Facility (PITZ). The system delivers deep UV pulse trains up to 1 ms long at repetition rates as high as 4.5 MHz, with temporal and spatial shaping capabilities and individual amplitude control for bunch charge manipulation. The shaping features enable the generation of exceptionally low emittance electron beams, essential for extending the EuXFEL X-ray photon energy beyond 25 keV and for future high duty cycle upgrades. Temporal shaping is achieved through a high-resolution spatial light modulator in the near-infrared driver laser, allowing precise spectral amplitude and phase control of UV pulses. We will present advanced control schemes that pre-compensate for laser nonlinearities and initial experimental results at EuXFEL. We generated UV flat-top pulse profiles with durations ranging from 10ps to 20ps and successfully transferred them onto the electron beam. This achievement represents a significant step toward emittance optimization at EuXFEL and will expand the facility's operational energy range in the near future.
DDC Class
600: Technology
Publication version
publishedVersion
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THPB027.pdf
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2.2 MB
Format
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