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Item type:Publication, Access status: with files , Functional vanadium oxide nanostructures fabricated via atomic layer deposition: a review(Elsevier, 2026-05-05); ; ; ; Vanadium oxide nanostructures have emerged as a promising material system for a wide range of applications based on their structural, electronic, optical, and catalytic properties. The multiple phases of vanadium oxides, e.g., V2O3, VO2, and V2O5, feature distinct crystal structures and properties which contribute to their versatility. There are several methods to fabricate vanadium oxide nanostructures such as sol-gel synthesis, hydrothermal methods, physical vapor deposition, sputter deposition, chemical vapor deposition, atomic layer deposition (ALD), and solid-state reactions. From those techniques, ALD offers precise control over the conformality, thickness, and composition of thin films leading to unique possibilities for the functionalization of previously prepared nanostructured templates with vanadium oxides. This review summarizes recent advancements in the synthesis of ALD-based vanadium oxide nanostructures focusing on suitable ALD precursors, ALD process conditions, and required post-deposition thermal annealing treatments to transform the as-deposited vanadium oxide films to distinguished crystalline phases. The functional properties of ALD-based vanadium oxide nanostructures in catalysis, electrochemical energy storage, sensors, and stimuli-responsive “smart” devices are presented. Moreover, existing challenges in fabrication and practical application are discussed. Finally, future perspectives on tailoring the properties of ALD-based vanadium oxide nanostructures by adjusting templates, optimizing the vanadium oxide film thickness, or utilizing supercycle ALD processes are outlined, which can pave the way for sustainable applications and “smart” devices.Publicationtype: Review Article49 57 - Some of the metrics are blocked by yourconsent settings
Item type:Publication, Access status: with files , Photonic materials for high-temperature applications: synthesis and characterization by X-ray ptychographic tomography(Elsevier, 2018-12-01); ; ; ; Photonic materials for high-temperature applications need to withstand temperatures usually higher than 1000 °C, whilst keeping their function. When exposed to high temperatures, such nanostructured materials are prone to detrimental morphological changes, however the structure evolution pathway of photonic materials and its correlation with the loss of material's function is not yet fully understood. Here we use high-resolution ptychographic X-ray computed tomography (PXCT) and scanning electron microscopy (SEM) to investigate the structural changes in mullite inverse opal photonic crystals produced by a very-low-temperature (95 °C) atomic layer deposition (ALD) super-cycle process. The 3D structural changes caused by the high-temperature exposure were quantified and associated with the distinct structural features of the ceramic photonic crystals. Other than observed in photonic crystals produced via powder colloidal suspensions or sol-gel infiltration, at high temperatures of 1400 °C we detected a mass transport direction from the nano pores to the shells. We relate these different structure evolution pathways to the presence of hollow vertexes in our ALD-based inverse opal photonic crystals. Although the periodically ordered structure is distorted after sintering, the mullite inverse opal photonic crystal presents a photonic stopgap even after heat treatment at 1400 °C for 100 h.Publicationtype: Journal ArticleScopus© Citations 20 334 464