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Item type:Publication, Access status: without files , Feldexpositionskonformer induktiver 13,56 MHz-Energie-Harvester für tief implantierte medizinische Systeme(2021-11); ; Publicationtype: Conference Paper38 - Some of the metrics are blocked by yourconsent settings
Item type:Publication, Access status: without files , TXRF calibration samples fabricated by atomic layer deposition (ALD) and photolithography(2021-11); ; In this contribution, an innovative fabrication process for metallic trace element reference samples is introduced. These can be used to calibrate and maintain tools for the detection of those metallic trace elements like the total reflection x-ray fluorescence (TXRF) method which are used in semiconductor and microsystem fabrication facilities. The fabrication process is based on the complete covering of silicon wafers with atomic layer deposition (ALD) and structuring of this layer using photolithography. ALD is the deposition process of choice, since the self limiting behavior is well suited to cover the whole wafer with an minimal amount of material. Samples with metal amounts as low as 1010 atoms per cm2 could be achieved with that process.Publicationtype: Conference Paper70 - Some of the metrics are blocked by yourconsent settings
Item type:Publication, Access status: without files , 108 - Some of the metrics are blocked by yourconsent settings
Item type:Publication, Access status: without files , Closed-Loop CMOS Stresskartierungssystem mit 4-Bit einstellbarer Sensitivität basierend auf 32 FET Stresssensoren(2021-11); Publicationtype: Conference Paper115 - Some of the metrics are blocked by yourconsent settings
Item type:Publication, Access status: without files , High Refractive Index Integrated Photonics on Glass Substrates(2021-11); ; ; ; Silicon photonic circuits based on high index contrast waveguides for near-infrared applications are commonly manufactured on commercially available crystalline silicon-on-insulator (SOI) or on oxidized silicon wafers if the waveguide core layer is fabricated by deposition methods. We present a novel manufacturing approach of compact amorphous silicon photonic circuit components directly deposited and patterned on fused silica glass wafers. The additional substrate transparency at the visible wavelengths region, an increased thermal heating efficiency of the integrated components, and the ease of alignment of photonic backplanes on underlying photonic or electronic microchips are some advantages to highlight compared to oxidized silicon substrates.Publicationtype: Conference Paper75 - Some of the metrics are blocked by yourconsent settings
Item type:Publication, Access status: without files , Athermal electro-optic trimmable waveguide design(2021-11); ; ; High-speed photonic circuits suffer from unnecessary static and dynamic power consumption required for the correction of fabrication non-uniformities and thermal drifts. We propose amorphous silicon on lithium niobate waveguides with a titanium dioxide cladding to obtain a versatile integrated photonics platform. The linear electro-optic tuning mechanism of lithium niobate can be utilized for a tunability up to -7.2 · 10-6 V-1, while the titanium dioxide cladding is employed to minimize the temperature sensitivity and thus the influence of thermal drifts.Publicationtype: Conference Paper63